Compound, polymer, composition, composition for film formation, pattern formation method, insulating film formation method, and method for producing compound, as well as method for producing iodine-containing vinyl polymer and acetylated derivative thereof
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsTadashi OMATSU, Kentaro KATAOKA, Masahiro MATSUMOTO, Yushi NIIMI, Takashi MAKINOSHIMA, Masatoshi ECHIGO
Life of this patent
Estimating the term…