Hardmask composition, hardmask layer, and pattern forming method

A hardmask composition comprising a compound represented by Chemical Formula 1 and a solvent:

• wherein, in Chemical Formula 1,
• A is a C6 to C30 aromatic moiety,
• R1 to R5 are each independently hydrogen, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C3 to C30 heteroaryl group, or a combination thereof or a group represented by Chemical Formula 2,
• at least one of R1 to R5 is a group represented by Chemical Formula 2, and
• n is an integer greater than or equal to 2,
• wherein, in Chemical Formula 2,
• X is a substituted or unsubstituted C6 to C30 arylene group,
• Y is a substituted C6 to C60 aryl group or a substituted or unsubstituted C3 to C60 heteroaryl group, wherein the substituted C6 to C60 aryl group includes a substituent selected from hydroxy group, amine group, mercapto group, a substituted or unsubstituted C1 to C30 alkoxy group, a substituted or unsubstituted C1 to C30 alkylthiol group, a substituted or unsubstituted C1 to C20 alkylamine group, a substituted or unsubstituted C3 to C30 heteroaryl group, or a combination thereof,
• m is 0 or 1, and
• indicates a linking point with Chemical Formula 1.