Composition for Cobalt Electroplating Comprising Leveling Agent
AssigneeBASF SE
InventorsNadine ENGELHARDT, Dieter MAYER, Marco ARNOLD, Alexander FLUEGEL, Charlotte EMNET, Lucas Benjamin HENDERSON
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AssigneeBASF SE
InventorsNadine ENGELHARDT, Dieter MAYER, Marco ARNOLD, Alexander FLUEGEL, Charlotte EMNET, Lucas Benjamin HENDERSON
Estimating the term…
Described herein is a cobalt electrodeposition composition including cobalt ions, and particular leveling agents including X1—CO—O—R11, X1—SO2—O—R11, X1—PO(OR11)2, X1—SO—O—R11 functional groups, where X1 is a divalent group selected from (i) a chemical bond (ii) aryl, (iii) C1 to C12 alkandiyl, which may be interrupted by O atoms, (iv) an arylalkyl group —X11—X12—, (v) an alkylaryl group —X12—X11— and (vi) —(O—C2H3R12)mO—, R11 is selected from H and C1 to C4 alkyl. R12 is selected from H and C1 to C4 alkyl, X12 is a divalent aryl group, and X11 is a divalent C1 to C15 alkandiyl group.
1-16. (canceled)
A composition, comprising:
Dependencies are inferred from the claim text.