Full-reflection display substrate, manufacturing method thereof and full-reflection display device

A method for manufacturing a full-reflection display substrate, comprising:

• providing a base substrate, the base substrate including a display region and a non-display region;
• forming a signal line in the display region and forming a bonding pin in the non-display region, the bonding pin being coupled to the signal line and bonded to a driving circuitry;
• forming a first conductive film layer on the base substrate, the first conductive film layer covering the display region and the non-display region;
• forming a first photoresist pattern and a second photoresist pattern on the first conductive film layer, the first photoresist pattern being arranged in the display region, and the second photoresist pattern being arranged in the non-display region;
• wet-etching the first conductive film layer with the first photoresist pattern and the second photoresist pattern as masks to obtain a reflection layer and an etch stop pattern, the reflection layer being arranged in the display region, and the etch stop pattern being arranged in the non-display region and at least covering a side surface of the bonding pin;
• and removing the first photoresist pattern and the second photoresist pattern.