Data processing method and system for detection of deterioration of semiconductor process kits

A data processing system for detection of deterioration of semiconductor process kits, comprising:

• an alignment calculation unit to receive a plurality of Raman spectra data of a semiconductor process kit and perform error unification calculation on the Raman spectra data with respect to all dimensions to eliminate inconsistency of the detection results of the semiconductor process kit under detection within different deterioration detecting system of semiconductor process kits;
• a derivative calculation unit being electrically connected with the alignment calculation unit to receive the Raman spectra data resulted from the alignment calculation unit and to perform ratio calculation with respect to different dimensions on the gaps between any two of all the spectral peaks of each of the resulted Raman spectra data to obtain a first parameter representing changes of the strength of all the spectral peaks of each of the Raman spectra data as the Raman spectra shift changes;
• a scale normalization unit being electrically connected with the derivative calculation unit to receive the first parameter and to perform scaling and normalization on the first parameter to obtain a second parameter;
• a dimension reduction calculation unit being electrically connected with the scale normalization unit to receive the second parameter and to perform dimension reduction calculation on the second parameter to obtain a third parameter;
• and
• a standard deviation calculation unit being electrically connected with the dimension reduction calculation unit to receive the third parameter and to perform standard deviation calculation on the third parameter to obtain a first deterioration state determining parameter indicating the aging degree of the semiconductor process kit and a second deterioration state determining parameter indicating the degree of variation of the internal molecular structure of the semiconductor process kit.