Light sensitive device
AssigneeNexdot
InventorsMichele D'AMICO, Alexis KUNTZMANN, Yu-Pu LIN, Vladyslav VAKARIN
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Abstract
A light sensitive device including a substrate and high pass filter semiconductor nanoparticles distributed on the substrate. The substrate includes at least one photosensor, and the semiconductor nanoparticles are high pass filters in UV-visible-NIR light range. The light sensitive device has a density of the semiconductor nanoparticles per surface unit of greater than 5×109 nanoparticles.cm−2. Also, a process for the manufacture of the light sensitive device, and an image sensor that includes the light sensitive device.
Claims21
-19. (canceled)
A light sensitive device comprising a substrate and semiconductor nanoparticles distributed on the substrate according to a pattern, wherein substrate comprises at least one photosensor, wherein semiconductor nanoparticles are high pass filters in UV-visible-NIR light range, and wherein the light sensitive device comprises a density of semiconductor nanoparticles per surface unit greater than 5×109 nanoparticles.cm−2.
A process for the manufacture of a light sensitive device comprising a substrate and semiconductor nanoparticles distributed on the substrate according to a pattern comprising the steps of:
- i)providing a film;
- ii) creating a surface electric potential on the film according to the pattern;
- iii) bringing the film in contact with a colloidal dispersion of semiconductor nanoparticles being high pass filters in UV-visible-NIR light range for a contacting time of less than 15 minutes;
- and
- iv) transferring film on a photosensor sheet, yielding said substrate;
- wherein the light sensitive device comprises a density of semiconductor nanoparticles per surface unit greater than 5×109nanoparticles.cm−2.
A process for the manufacture of a light sensitive device comprising a substrate and semiconductor nanoparticles distributed on the substrate according to a pattern comprising the steps of:
- i)providing a film or a substrate comprising at least one photosensor;
- ii) ink-jetting a colloidal dispersion of semiconductor nanoparticles being high pass filters in UV-visible-NIR light range on the film or substrate according to the pattern;
- and
- iii) optionally, transferring film on a photosensor sheet, yielding a substrate comprising at least one photosensor;
- wherein the light sensitive device comprises a density of semiconductor nanoparticles per surface unit greater than 5×109nanoparticles.cm−2.
An image sensor comprising a light sensitive device comprising a substrate and semiconductor nanoparticles distributed on the substrate according to a pattern, wherein substrate comprises at least one photosensor, wherein semiconductor nanoparticles are high pass filters in UV-visible-NIR light range, and wherein the light sensitive device comprises a density of semiconductor nanoparticles per surface unit greater than 5×109 nanoparticles.cm−2.
Dependencies are inferred from the claim text.