# US 2022/0274263 A1 · Mass-Controlled Viscous Material Deposition System, Apparatus and Method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2022/0274263 A1 - Document ID: US20220274263A1 - Status: Published application - Kind: A1 - Application number: 17/187,835 - Filed: 2021-02-28 - Published: 2022-09-01 - Earliest claimed: 2021-02-28 - Inventors: William Miller - Web page: https://patentgrep.com/patent/US20220274263A1 ## CPC - B25J 11/0075: {Manipulators for painting or coating} - B25J 13/085: {Force or torque sensors (B25J13/082, B25J13/084 take precedence)} - B25J 9/1664: {characterised by motion, path, trajectory planning} - B25J 11/0045: {Manipulators used in the food industry} - G05B 19/4099: Surface or curve machining, making three-dimensional [3D] objects, e.g. desktop manufacturing - G05B 2219/49013: Deposit layers, cured by scanning laser, stereo lithography SLA, prototyping - G05B 2219/49021: Deposit layer, machine, mill layer, then new layer, SDM solid deposit manufacting - B25J: MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES ({manipulators specially adapted for use in surgery A61B34/70; manipulators used in cleaning hollow articles B08B9/04}; manipulators associated with rolling mills B21B39/20; manipulators associated with forging machines B21J13/10; {manipulators associated with picking-up and placing mechanisms B23P19/007}; means for holding wheels or parts thereof B60B30/00; {vehicles with ground-engaging propulsion means, e.g. walking members B62D57/02, B62D57/032; devices for picking-up and depositing articles or materials between conveyors B65G47/90, B65G47/91; manipulators with gripping or holding means for transferring packages B65H67/065}; cranes B66C; {manipulators used in the protection or supervision of pipe-line installations F17D5/00; walking equipment adapted for nuclear steam-generators F22B37/006}; manipulators specially adapted for, or associated with, nuclear reactors G21C; {apparatus used for handling wafers during manufacture or treatment of semiconductor H10P72/50}) - G05B: CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS (systems for controlling or regulating non-electric variables G05D; systems for regulating electric or magnetic variables G05F; control devices or systems insofar as characterised by mechanical features only G05G) ## Abstract A system and/or method comprising providing a robotic control structure having a support structure, said support structure being adapted and configured to be selectively positionable along a prescribed path by said robotic control structure; providing a viscous material deposition system adapted and configured to control deposition of a viscous material from said viscous material deposition system; providing a load sensor associated with said robotic control structure adapted and configured to determine a load of said viscous material supported by said support structure; and positioning said support structure along said prescribed path, wherein said positioning is controlled at least in part based upon said load. ## Claims ### Claim 1 An apparatus comprising: a robotic control structure having a support structure, said support structure being adapted and configured to be selectively positionable along a prescribed path by said robotic control structure; a viscous material deposition system adapted and configured to control deposition of a viscous material from said viscous material deposition system; and a load sensor associated with said robotic control structure adapted and configured to determine a load of said viscous material supported by said support structure; wherein a position of said support structure along said prescribed path is controlled at least in part based upon said load. ### Claim 2 (depends on 1) The apparatus of claim 1 wherein said load is an instantaneous load. ### Claim 3 (depends on 2) The apparatus of claim 2, wherein said position is an instantaneous position. ### Claim 4 (depends on 3) The apparatus of claim 3, wherein said load a mass. ### Claim 5 (depends on 1) The apparatus of claim 1, wherein said position is an instantaneous position. ### Claim 6 (depends on 5) The apparatus of claim 5, wherein said load is a mass. ### Claim 7 (depends on 1) The apparatus of claim 1, wherein a first load is associated with a first position of said support structure on said prescribed path. ### Claim 8 (depends on 7) The apparatus of claim 7, wherein said first load is associated with an initial weighpoint. ### Claim 9 (depends on 7) The apparatus of claim 7, wherein a second load is associated with a second position of said support structure on said prescribed path. ### Claim 10 (depends on 9) The apparatus of claim 9, wherein said second load is associated with a terminal weighpoint. ### Claim 11 (depends on 9) The apparatus of claim 9, wherein a third load is associated with a third position of said support structure on said prescribed path between said first position and said second position. ### Claim 12 (depends on 11) The apparatus of claim 11, wherein said third position is associated with an intermediate weighpoint. ### Claim 13 A method comprising: providing a robotic control structure having a support structure, said support structure being adapted and configured to be selectively positionable along a prescribed path by said robotic control structure; providing a viscous material deposition system adapted and configured to control deposition of a viscous material from said viscous material deposition system; providing a load sensor associated with said robotic control structure adapted and configured to determine a load of said viscous material supported by said support structure; and positioning said support structure along said prescribed path; wherein said positioning is controlled at least in part based upon said load. ### Claim 14 (depends on 13) The method of claim 13 wherein said load is an instantaneous load. ### Claim 15 (depends on 14) The method of claim 14, wherein said position is an instantaneous position. ### Claim 16 (depends on 15) The method of claim 15, wherein said load a mass. ### Claim 17 (depends on 13) The method of claim 13, wherein said position is an instantaneous position. ### Claim 18 (depends on 17) The method of claim 17, wherein said load is a mass. ### Claim 19 (depends on 13) The method of claim 13: wherein a first load is associated with a first position of said support structure on said prescribed path; and wherein said first load is associated with an initial weighpoint. ### Claim 20 (depends on 19) The method of claim 19: wherein a second load is associated with a second position of said support structure on said prescribed path; and wherein said second load is associated with a terminal weighpoint.