Nanoprojection devices as well as methods of making and using such devices
OwnerAnkur SINGH, Sungwoong KIM +1inventors
InventorsAnkur SINGH, Sungwoong KIM, Brian RUDD
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Abstract
The present application relates to a silicon nanoprojection device comprising a substrate having a surface and one or more nanoprojection structures having a proximal end attached to said substrate and extending away from the surface of the substrate to a distal end. The one or more nanoprojection structures either have a configuration which tapers narrowingly from the proximal end to the distal end or have an ionic coating. Also disclosed are methods of making and using the silicon nanoprojection device.
Claims58
A silicon nanoprojection device comprising:
- a substrate having a surface and
- one or more nanoprojection structures having a proximal end attached to said substrate and extending away from the surface of the substrate to a distal end, wherein said one or more nanoprojection structures have a configuration which tapers narrowingly from the proximal end to the distal end.
A silicon nanoprojection device comprising:
- a substrate having a surface;
- one or more nanoprojection structures having a proximal end attached to said substrate and extending away from the surface of the substrate to a distal end;
- and
- an ionic coating on said one or more nanoprojection structures.
A method of making a nanoprojection device, said method comprising:
- providing a silicon monolithic structure and
- carrying out a series of nanofabrication steps on the silicon monolithic structure to form one or more nanoprojection structures having a proximal end attached to a surface of a substrate and extending away from the surface of the substrate to a distal end, wherein said one or more nanoprojection structures have a configuration which tapers narrowingly from the proximal end to the distal end.
Dependencies are inferred from the claim text.