Method for metal vapor infiltration of cmc parts and articles containing the same
AssigneeRaytheon Technologies Corporation
InventorsLuke Borkowski, Alexander Staroselsky, Gajawalli V. Srinivasan, Ying She
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Abstract
A method comprises discharging from a metal vaporization device a vapor of a metal or a metal precursor to a chemical vapor infiltration device where the chemical vapor infiltration device is in fluid communication with the metal vaporization device. The chemical vapor infiltration device contains a preform containing ceramic fibers. The preform is infiltrated with a metallic coating or a coating of a metallic precursor along with a ceramic precursor coating. The metallic coating and/or the metallic precursor coating and the ceramic precursor coating are applied sequentially or simultaneously.
Claims16
A method comprising:
- discharging from a metal vaporization device a vapor of a metal or a metal precursor to a chemical vapor infiltration device;
- where the chemical vapor infiltration device is in fluid communication with the metal vaporization device;
- where the chemical vapor infiltration device contains a preform containing ceramic fibers;
- disposing upon the preform a metallic coating or a coating of a metallic precursor;
- disposing upon the preform a ceramic precursor coating;
- where the metallic coating and the ceramic precursor coating are applied sequentially or simultaneously.
An article comprising:
- a metal vaporization device;
- and
- a chemical vapor infiltration device;
- wherein the metal vaporization device is in fluid communication with the chemical vapor infiltration device;
- where the chemical vapor infiltration device is downstream of the metal vaporization device;
- where the article is operative to dispose on a portion of a preform a metal and a ceramic such that there is a gradient in a metal concentration from a region of majority ceramic content in the preform to a region of majority metal content.
Dependencies are inferred from the claim text.