Euv light source and apparatus for lithography

An extreme ultra violet (EUV) radiation source apparatus, comprising:

• a target droplet generator for generating a tin (Sn) droplet;
• a debris collection device;
• and
• a chamber enclosing at least the debris collection device, wherein:
• the debris collection device includes
• a first end support;
• a second end support;
• and
• a plurality of vanes, ends of which are supported by the first end support and the second end support, respectively,
• a surface of at least one of the plurality of vanes includes a catalytic layer including titanium oxide and Ru.

A method for generating extreme ultra violet (EUV) radiation, comprising:

• irradiating a tin droplet with laser light in a hydrogen gas ambient, thereby creating the EUV radiation;
• and
• reducing SnH4 by using a debris collection device to Sn, thereby collecting debris,
• wherein:
• the debris collection device includes a plurality of vanes, opposing ends of which are supported by a first end support and a second end support, respectively, and a surface of at least one of the plurality of vanes is coated with a catalytic layer including titanium oxide and Ru.