Oxide Aperture Shaping In Vertical Cavity Surface-Emitting Laser
AssigneeII-Vi Delaware, Inc.
InventorsMirko Hoser, Abram Jakubowicz, Tomi Leinonen
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Abstract
A corrected mesa structure for a VCSEL device is particularly configured to compensate for variations in the shape of the created oxide aperture that result from anisotropic oxidation. In particular, a corrected mesa shape is derived by determining the shape of an as-created aperture formed by oxidizing a circular mesa structure, and then ascertaining the compensation required to convert the as-created shape into a desired (“target”) shaped aperture opening. The compensation value is then used to modify the shape of the mesa itself such that a following anisotropic oxidation yields a target-shaped oxide aperture.
Claims6
A vertical cavity surface emitting laser (VCSEL) comprising:
- a substrate having a top major surface;
- a first distributed Bragg reflector (DBR) formed on the top major surface of the substrate, the first distributed Bragg reflector comprising a stack of layers of alternating refractive index value;
- a second DBR disposed over the first DBR and comprising a stack of layers of alternating refractive index, the second DBR exhibiting a corrected mesa structure of a predetermined cross-section geometry required to create an oxide aperture of a targeted shape;
- an active layer disposed between the first DBR and the second DBR;
- and
- an aperture layer disposed within the mesa structure, wherein the aperture layer is formed of a composition that exhibits anisotropic oxidation, the aperture layer including an outer insulating boundary region coincident with sidewalls of the corrected mesa structure and an inner oxide aperture of a target shape, the target shape defined by anisotropic oxidation of the aperture layer.
Dependencies are inferred from the claim text.