In-memory resistive random access memory xor logic using complimentary switching
AssigneeInternational Business Machines Corporation
InventorsTakashi Ando, Nanbo Gong, Guy M. Cohen
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Abstract
In a method for using or forming a semiconductor structure. The semiconductor structure may include a resistive random access memory (RRAM) gate with a first electrode and a second electrode. The RRAM gate may also include a switching layer that includes a dielectric material having a switching layer k-value and a switching layer thermal conductivity. The RRAM gate may also include a complimentary switching (CS) mitigation layer with a material having a CS k-value that is lower than the switching layer k-value and a CS thermal conductivity that is higher than the switching layer thermal conductivity.
Claims20
A method, comprising:
- providing a resistive random access memory (RRAM) gate comprising:
- a first electrode;
- a second electrode;
- switching layer comprising a dielectric material;
- and
- a complimentary switching (CS) mitigation layer comprising a material having a CS k-value that is lower than a k-value of the switching layer and a CS thermal conductivity that is higher than a thermal conductivity of the switching layer;
- resetting the RRAM gate by supplying a Vreset voltage pulse;
- performing a logic operation by supplying the first electrode with a first bias and the second electrode with a second bias, wherein the first bias comprises a selection from the group consisting of zero voltage and a positive complimentary switching voltage (Vset), and the second bias comprises a selection from the group consisting of zero voltage and negative Vset;
- and
- sensing a bias state of the RRAM gate using a sensing voltage that is lower than Vset, wherein a Vset voltage from the first electrode alone or the second electrode alone results in a bias state equal to 1, and a Vset voltage from both the first electrode and the second electrode or a zero voltage from the first electrode and the second electrode results in a bias state equal to 0.
A resistive random access memory (RRAM) gate, comprising:
- a first electrode;
- a second electrode;
- a switching layer comprising a dielectric material having a switching layer k-value and a switching layer thermal conductivity;
- and
- a complimentary switching (CS) mitigation layer comprising a material having a CS k-value that is lower than the switching layer k-value and a CS thermal conductivity that is higher than the switching layer thermal conductivity.
A method of forming a semiconductor structure, comprising:
- forming a first electrode;
- forming a switching layer comprising a dielectric material having a switching layer k-value and a switching layer thermal conductivity;
- forming a complimentary switching (CS) mitigation layer comprising a material having a CS k-value that is lower than the switching layer k-value and a CS thermal conductivity that is higher than the switching layer thermal conductivity;
- forming a second electrode on an opposite side of the switching layer and the CS mitigation layer from the first electrode.
Dependencies are inferred from the claim text.