Display device and manufacturing method

A display device including a plurality of pixels and pixel circuits corresponding to the plurality of pixels, the display device comprising:

• a substrate;
• a semiconductor layer;
• a gate insulating film;
• a gate electrode;
• a first interlayer insulating film;
• a capacitance electrode;
• and
• a second interlayer insulating film, the semiconductor layer, the gate insulating film, the gate electrode, the first interlayer insulating film, the capacitance electrode, and the second interlayer insulating film being sequentially layered on the substrate,
• wherein each of the pixel circuits includes a drive transistor, a capacitor and a connection wiring line,
• the drive transistor includes the semiconductor layer, the gate insulating film, and the gate electrode overlapping with each other in plan view,
• the capacitor includes the gate electrode, the first interlayer insulating film, and the capacitance electrode overlapping with each other in plan view,
• the semiconductor layer is provided with a channel region and conductor regions sandwiching the channel region therebetween,
• the capacitance electrode is provided with a first opening in a portion of a position overlapping with the gate electrode in plan view,
• the first interlayer insulating film and the second interlayer insulating film include a contact hole provided at a position surrounded by the first opening,
• the connection wiring line is provided on the second interlayer insulating film and is connected to the gate electrode via the contact hole,
• the contact hole overlaps with a portion of the channel region in plan view,
• the contact hole is provided to intersect at least one end of the channel region in a channel width direction orthogonal to a channel length direction in which the conductor regions face each other,
• the contact hole is provided to intersect both ends of the channel region in the channel width direction, and
• the contact hole is extended in the channel length direction along the channel region.

A manufacturing method of a display device including a plurality of pixels and pixel circuits corresponding to the plurality of pixels, the manufacturing method comprising:

• performing film formation of a semiconductor film on a substrate;
• forming a semiconductor layer by patterning the semiconductor film;
• performing film formation of a gate insulating film on the semiconductor layer;
• performing film formation of a first metal layer on the gate insulating film;
• forming a gate electrode by patterning the first metal layer,
• performing film formation of a first interlayer insulating film on the gate electrode;
• performing film formation of a second metal layer on the first interlayer insulating film;
• forming a capacitance electrode including a first opening and a second opening in a portion of a position overlapping with the gate electrode in plan view by patterning the second metal layer;
• performing film formation of a second interlayer insulating film on the first interlayer insulating film and the capacitance electrode;
• forming a contact hole surrounded by the first opening and a hole surrounded by the second opening in the first interlayer insulating film and the second interlayer insulating film in plan view by performing patterning;
• performing annealing;
• performing film formation of a third metal layer on the second interlayer insulating film;
• and
• forming a connection wiring line electrically connected to the gate electrode via the contact hole by patterning the third metal layer.