Layout for measuring overlapping state

A layout for measuring an overlapping state, comprising:

• a layout region;
• a first dummy active area region located in the layout region;
• and
• multiple dummy component regions stacked in the layout region, wherein
• at the moment when one of the dummy component regions is formed on the first dummy active area region, the one of the dummy component regions and the first dummy active area region have a first overlapping region, and the first overlapping region does not comprise other dummy component regions among the dummy component regions, wherein
• the dummy component regions are selected from a group consisting of a dummy buried word line region, a dummy bit line contact region, and a dummy bit line region,
• the dummy buried word line region is located in the first dummy active area region, and the dummy buried word line region is smaller than the first dummy active area region.