Material growth on wide-bandgap semiconductor materials
AssigneeAkash Systems, Inc.
InventorsDaniel FRANCIS, Felix EJECKAM, Tyrone D. MITCHELL, JR., Paul SAUNIER
Life of this patent
Estimating the term…
Loading patent…
AssigneeAkash Systems, Inc.
InventorsDaniel FRANCIS, Felix EJECKAM, Tyrone D. MITCHELL, JR., Paul SAUNIER
Estimating the term…
Aspects of diamond growth on semiconductors are described. Some aspects include direct growth of synthetic diamond on wide-bandgap semiconductors without the use of nucleating layers or protective layers. Some aspects include generating synthetic diamond over a gallium nitride surface of a layered structure in accordance with a set of growth parameters that are generated based at least in part on an interface property of an interface generated between the gallium nitride surface and the synthetic diamond. In some aspects, the interface is a single interface between the synthetic diamond and the gallium nitride surface. In some aspects, the synthetic diamond is in contact with the gallium nitride surface. Some aspects include synthetic diamond growth on wide-bandgap semiconductor structures to achieve thermal extraction without introducing electrically conductive regions in the semiconductor structure. Such aspects may include generating less than optimal quality synthetic diamond.
-23 (canceled)
A semiconductor apparatus comprising:
(canceled)
(canceled)
(canceled)
(canceled)
A semiconductor-containing structure comprising a structure of a semiconductor material in contact with at least one layer of synthetic diamond at a single interface, wherein a thermal conductivity of the at least one layer of synthetic diamond is within a range from about 50 W/mK to about 500 W/mK.
(canceled)
(canceled)
(canceled)
(canceled)
-69 (canceled)
Dependencies are inferred from the claim text.