Defect free germanium oxide gap fill
AssigneeApplied Materials, Inc.
InventorsHuiyuan Wang, Susmit Singha Roy, Takehito Koshizawa, Bo Qi, Abhijit Basu Mallick
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Abstract
Methods for forming defect-free gap fill materials comprising germanium oxide are disclosed. In some embodiments, the gap fill material is deposited by exposing a substrate surface to a germane precursor and an oxidant simultaneously. The germane precursor may be flowed intermittently. The substrate may also be exposed to a second oxidant to increase the relative concentration of oxygen within the gap fill material.
Claims20
A method for depositing a gap fill material, the method comprising exposing a substrate surface comprising at least one feature to a germane precursor and a first oxidant to deposit a gap fill material comprising germanium oxide within the at least one feature, the at least one feature having an opening width and extending a depth into the substrate, the gap fill material having substantially no voids nor seam.
A method for depositing a gap fill material, the method comprising exposing a substrate surface comprising at least one feature to a constant flow of a first oxidant and an alternating flow of a germane precursor and a second oxidant to deposit a gap fill material comprising germanium oxide within the at least one feature, the at least one feature having an opening width and extending a depth into the substrate, the germane precursor and the second oxidant each having a duty cycle of less than or equal to 25%, the gap fill material having substantially no voids nor seam.
A method of selectively removing germanium oxide comprising exposing a germanium oxide layer to a basic aqueous solution.
Dependencies are inferred from the claim text.