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US 2022/0189809 A1Published application
Batch processing oven and operating methods
AssigneeYield Engineering Systems, Inc.
InventorsMark William Curry, Ronald R. Stevens, Craig W. McCoy, Charudatta Galande, Gabriel Ormonde
Life of this patent
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Abstract
A batch processing oven comprising a processing chamber and a rack configured to be positioned in the processing chamber. The rack is configured to support a plurality of substrates and a plurality of panels in a stacked manner such that one or more substrates of the plurality of substrates are positioned between at least one pair of adjacent panels of the plurality panels. Vertical gaps separate each substrate of the one or more substrates from an adjacent substrate or panel on either side of the substrate.
Claims25
A batch processing oven, comprising:
- a processing chamber;
- and
- a rack configured to be positioned in the processing chamber, wherein the rack is configured to support a plurality of substrates and a plurality of panels in a stacked manner such that (a) one or more substrates of the plurality of substrates are positioned between at least one pair of adjacent panels of the plurality panels, and (b) vertical gaps separate each substrate of the plurality of substrates from an adjacent substrate or panel on either side of the substrate.
A method of operating a batch processing oven, comprising:
- positioning a rack in a processing chamber of the oven, wherein the rack supports a plurality of substrates and a plurality of panels in a stacked manner such that (a) one or more substrates of the plurality of substrates are positioned between at least one pair of adjacent panels of the plurality panels, and (b) vertical gaps separate each substrate of the plurality of substrates from an adjacent substrate or panel on either side of the substrate;
- and
- directing a flow of a hot gas into the processing chamber to heat the plurality of substrates.
A batch processing oven, comprising:
- a substantially cylindrical processing chamber;
- an inlet dissipater including multiple inlet tubes extending in a lengthwise direction along an internal wall of the processing chamber, the multiple inlet tubes being arranged circumferentially to form a partial arc around the internal wall, each inlet tube of the multiple inlet tubes including a plurality of inlet ports spaced apart from each other in the lengthwise direction, the plurality of inlet ports being configured to direct a hot gas into the processing chamber;
- an exhaust dissipater positioned diametrically opposite the inlet dissipater, the exhaust dissipater being configured to exhaust the gas from the processing chamber;
- and
- a rack configured to be positioned in the processing chamber, wherein the rack is configured to support a plurality of substrates and a plurality of panels in a stacked manner such that (a) one or more substrates of the plurality of substrates are positioned between at least one pair of adjacent panels of the plurality panels, and (b) vertical gaps separate each substrate of the one or more substrates from an adjacent substrate or panel on either side of the substrate.
2 more elements
A batch processing oven, comprising:
- a processing chamber;
- a rack configured to be positioned in the processing chamber, wherein the rack is configured to support a plurality of substrates and a plurality of panels in a stacked manner such that one or more substrates of the plurality of substrates are positioned between at least one pair of adjacent panels of the plurality panels;
- an inlet dissipater positioned on one side of the rack, the inlet dissipater being configured to direct gas into the processing chamber, the gas being configured to heat the plurality of substrates in the rack;
- an outlet dissipater positioned on an opposite side of the rack, the exhaust dissipater being configured to exhaust the gas from the processing chamber;
- a plurality of thermocouples positioned in the processing chamber, wherein the plurality of thermocouple include a first thermocouple positioned at a first region of the processing chamber, a second thermocouple positioned at a second region of the processing chamber, and a third thermocouple positioned at a third region of the processing chamber;
- and
- a control system configured to receive input from the plurality of thermocouples and control a temperature or a flow rate of the gas directed into the processing chamber through the inlet dissipater.
4 more elements
Dependencies are inferred from the claim text.