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US 2022/0189794 A1Published application
Systems for integrated decomposition and scanning of a semiconducting wafer
AssigneeElemental Scientific, Inc.
InventorsTyler Yost, Daniel R. Wiederin, Beau Marth, Jared Kaser, Jonathan Hein, Jae Seok Lee, Jae Min Kim, Stephen H. Sudyka
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Abstract
Systems and methods are described for integrated decomposition and scanning of a semiconducting wafer, where a single chamber is utilized for decomposition and scanning of the wafer of interest.
Claims21
-20. (canceled)
A nozzle system for scanning a surface of a material comprising:
- a nozzle including
- a nozzle body defining a first fluid port in fluid communication with a first nozzle port, and defining a second nozzle port in fluid communication with a second fluid port, the nozzle body configured to receive a fluid through the first fluid port and direct the fluid through the first nozzle port to introduce the fluid to a surface of a material, and
- a nozzle hood extending from the nozzle body adjacent the first nozzle port and the second nozzle port and defining a channel disposed between the first nozzle port and the second nozzle port, the nozzle hood configured to direct the fluid from the first nozzle port to the second nozzle port along the surface of the material;
- and
- a nozzle housing including
- a housing body defining an interior portion and an aperture through which at least a portion of the nozzle can pass when transitioning between an extended position and a retracted position.
3 more elements
A nozzle for scanning a surface of a material comprising:
- a nozzle body defining a fluid port in fluid communication with a nozzle port, the nozzle body configured to receive a fluid through the inlet port and direct the fluid through the nozzle port to introduce the fluid to a surface of a material;
- and
- a nozzle hood extending from the nozzle body adjacent the nozzle port and configured to translate longitudinally across the surface of the material, the nozzle hood defining a channel disposed along a longitudinal portion of the nozzle hood at least partially between the nozzle port and an end of the longitudinal portion of the nozzle hood distal the nozzle port, the nozzle hood configured to direct the fluid from the nozzle port to the end of the longitudinal portion along the surface of the material.
Dependencies are inferred from the claim text.