Substrate processing method and substrate processing apparatus

A substrate processing apparatus comprising:

• a mixed processing liquid supplying unit which supplies, to a front surface of a substrate, a mixed processing liquid, being a mixed processing liquid, in which a first sublimable substance and a first additive, differing from the first sublimable substance, are mixed, and being lower in freezing point than the first sublimable substance;
• a freezing unit which makes a liquid film of the mixed processing liquid freeze;
• and
• a controller, controlling the mixed processing liquid supplying unit and the freezing unit;
• and
• wherein the controller is programmed to execute a mixed liquid film forming step of supplying the mixed processing liquid to the front surface of the substrate by the mixed processing liquid supplying unit to form the liquid film of the mixed processing liquid on the front surface of the substrate, a freezing step of making the liquid film of the mixed processing liquid freeze by the freezing unit to form a frozen body, and a sublimating step of vaporizing and removing the first sublimable substance, contained in the frozen body, from the front surface of the substrate.