Drying unit and apparatus for processing a substrate including a drying unit
AssigneeSemes Co., Ltd.
InventorsDahyun KIM, Hakjun LEE, Yonghyun HAM
Life of this patent
Estimating the term…
Abstract
An apparatus for processing a substrate may include a processing module including at least one process chamber for processing a desired process on a substrate, an index module for transferring the substrate from an outside into the processing module, and a drying unit for removing a moisture or undesired gases from the at least one process chamber. The drying unit may remove the moisture or the undesired gases from components newly installed in the at least one process chamber.
Claims20
A drying unit for removing a moisture or undesired gases from a process chamber, which comprises:
- at least one light source for emitting a light;
- and
- a control member for providing a power to the at least one light source and controlling the at least one light source.
A process chamber for processing a desired process on a substrate, which comprises:
- a housing providing a processing space therein;
- a supporting unit installed in the housing for supporting the substrate;
- and
- a drying unit placed on the supporting unit instead of the substrate, the drying unit removing a moisture or undesired gases from components newly installed in the process chamber.
An apparatus for processing a substrate, which comprises:
- a processing module including at least one process chamber for processing a desired process on a substrate;
- an index module for transferring the substrate from an outside into the processing module;
- and
- a drying unit for removing a moisture or undesired gases from the at least one process chamber.
Dependencies are inferred from the claim text.