Retuning for impedance matching network control
AssigneeComet Technologies USA, Inc.
InventorsAnthony Oliveti, Daniel Catalan, Liang Ouyang
Life of this patent
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AssigneeComet Technologies USA, Inc.
InventorsAnthony Oliveti, Daniel Catalan, Liang Ouyang
Estimating the term…
A physical vapor deposition system may include an RF generator configured to transmit an AC process signal to a physical vapor deposition chamber via an RF matching network. A controller of the RF matching network receives the DC magnitude and phase error signals and varies an impedance of the RF matching network in response to the DC magnitude and phase error signals. The matching network operates in a first mode until a tuning dead-zone is determined. Once a tuning dead-zone is determined, the matching network operates in additional modes until the network is tuned. The controller uses a composite value of magnitude and phase error to drive the variable tuning and load capacitors. In some cases, a blended mode (representing multiple tuning algorithms concurrently) may be implemented as a single mode that weights across what would have been multiple modes and thereby tunes the network using a weighted blended mode.
A method for tuning an impedance matching network, comprising receiving an RF input signal;
A matching network system, comprising:
A radio frequency plasma processing device comprising:
Dependencies are inferred from the claim text.