Electron beam irradiation apparatus and electron beam irradiation method

An electron beam irradiation apparatus comprising:

• a photoelectric surface configured to receive irradiation of excitation light on a side of a front surface, and generate a plurality of electron beams from a side of a back surface;
• a blanking aperture array mechanism provided with passage holes corresponding to the plurality of electron beams and configured to perform deflection control on each of the plurality of electron beams passing through the passage holes;
• a limit aperture substrate provided with an opening and configured to limit passage of the plurality of electron beams;
• a stage on which a target object irradiated with the plurality of electron beams having passed through the blanking aperture array mechanism and the limit aperture substrate can be mounted;
• and
• an adjustment mechanism configured to adjust at least one of an orbit of transmitted light that passes through at least one of arrangement objects including the photoelectric surface, the blanking aperture array mechanism, and the limit aperture substrate up to the stage and reaches the stage, among an irradiated excitation light, and an orbit of the plurality of electron beams,
• wherein
• the arrangement objects shield at least a part of the transmitted light.