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AssigneeASML Netherlands B.V.
InventorsQingpo XI, Xuerang HU, Xuedong LIU, Weiming REN, Zhong-wei CHEN
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A multi-beam inspection apparatus including an adjustable beam separator is disclosed. The adjustable beam separator is configured to change a path of a secondary particle beam. The adjustable beam separator comprises a first Wien filter and a second Wien filter. Both Wien filters are aligned with a primary optical axis. The first Wien filter and the second Wien filter are independently controllable via a first excitation input and a second excitation input, respectively. The adjustable beam separator is configured move the effective bending point of the adjustable beam separator along the primary optical axis based on the first excitation input and the second excitation input.
An adjustable charged particle beam separator configured to change a path of a secondary particle beam, comprising:
A method of inspecting a wafer using a multi-beam system with a secondary projection system to project a plurality of secondary electron beams onto a detection surface, the method comprising:
Dependencies are inferred from the claim text.