Substrate treating apparatus and substrate treating method
AssigneeSemes Co., Ltd.
InventorSUNG MIN LIM
Life of this patent
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Abstract
Disclosed is a substrate treating apparatus for performing treatment of a plurality of substrates. The apparatus may include a load port configured to load a conveying container for receiving the plurality of substrates; a plurality of process chambers configured to perform the treatment of the substrates; a transfer chamber configured to convey the substrates between the load port and the process chamber; and a control unit configured to control the transfer chamber to convey the substrates by applying a flow recipe, wherein the control unit may control a mode of the corresponding process chamber to be changed when there is a process chamber where abnormality occurs among the plurality of process chambers included in the flow recipe while the flow recipe is applied.
Claims13
A substrate treating apparatus for performing treatment of a plurality of substrates, comprising:
- a load port configured to load a conveying container for receiving the plurality of substrates;
- a plurality of process chambers configured to perform the treatment of the plurality of substrates;
- a transfer chamber configured to convey each of the plurality of substrates between the load port and a corresponding one of the plurality of process chambers;
- and
- a control unit configured to control the transfer chamber to convey the plurality of substrates by applying a flow recipe,
- wherein the control unit controls a mode of the corresponding process chamber to be changed when abnormality occurs to the corresponding process chamber while the flow recipe is applied.
-17. (canceled)
A substrate treating apparatus for performing treatment of a plurality of substrates, comprising:
- a plurality of load ports configured to load a conveying container for receiving the plurality of substrates;
- a plurality of process chambers configured to perform the treatment of the plurality of substrates;
- a transfer chamber configured to convey the plurality of substrates between the plurality of load ports and the plurality of process chambers;
- and
- a control unit configured to control the transfer chamber to convey the plurality of substrates by applying a flow recipe,
- wherein the plurality of load ports include a first load port and a second load port,
- wherein the plurality of process chambers include a first process chamber, a second process chamber, and a third process chamber,
- wherein the flow recipe of the first load port and the second load port is the order of the first process chamber and the third process chamber, and
- wherein the control unit controls the flow recipe to be performed by including the second process chamber when the second process chamber is operable during the flow recipe treatment of the second load port.
Dependencies are inferred from the claim text.