Selecting a set of locations associated with a measurement or feature on a substrate
AssigneeASML Netherlands B.V.
InventorsPierluigi FRISCO, Svetla Petrova MATOVA, Jochem Sebastiaan WILDENBERG
Life of this patent
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Abstract
A method for selecting an optimal set of locations for a measurement or feature on a substrate, the method includes: defining a first candidate solution of locations, defining a second candidate solution with locations based on modification of a coordinate in a solution domain of the first candidate solution, and selecting the first and/or second candidate solution as the optimal solution according to a constraint associated with the substrate.
Claims21
-15. (canceled)
A method for selecting an optimal solution comprising an optimal set of locations on a substrate associated with positions configured for performing measurements or placement of features, the method comprising:
- defining a first set comprising one or more candidate solutions, each of the candidate solutions comprising a set of locations;
- defining a second set comprising one or more candidate solutions, each of the candidate solutions comprising a set of locations generated by modification of one or more candidate solutions from the first set, wherein the modification involves an operation selected from one or more selected from:
- duplication, mutation and/or cross-over;
- and
- selecting, by a hardware computer system, one or more candidate solutions from the first set and/or second set as the optimal solution.
A computer program product comprising a non-transitory computer-readable medium having instructions therein, the instructions, when executed by a computer system, configured to cause the computer system to at least:
- define a first set comprising one or more candidate solutions, each of the candidate solutions comprising a set of locations;
- define a second set comprising one or more candidate solutions, each of the candidate solutions comprising a set of locations generated by modification of one or more candidate solutions from the first set, wherein the modification involves an operation selected from one or more selected from:
- duplication, mutation and cross-over;
- and
- select one or more candidate solutions from the first set and/or second set as an optimal solution comprising an optimal set of locations on a substrate associated with positions configured for performing measurements or placement of features.
A method for selecting an optimal solution comprising an optimal set of locations on a substrate associated with positions configured for performing measurements or placement of features, the method comprising:
- define a first set comprising one or more candidate solutions, each of the candidate solutions comprising a set of locations;
- define a second set comprising one or more candidate solutions, each of the candidate solutions comprising a set of locations generated by modification of one or more candidate solutions from the first set;
- and
- selecting one or more candidate solutions from the first set and/or second set as the optimal solution.
Dependencies are inferred from the claim text.