Method and apparatus for predicting substrate image

A method comprising:

• obtaining a training data set comprising (i) metrology data of a metrology tool used to measure a printed pattern of a substrate, and (ii) a representation of a mask pattern employed for imaging the printed pattern on the substrate;
• and
• training, based on the training data set, a machine learning model operable to predict a substrate image of the substrate as measured by the metrology tool based on a cost function, wherein the substrate image corresponds to the printed pattern of the substrate as measured via the metrology tool,
• wherein the predicted substrate image that is produced by the machine learning model comprises a segmented image.

A method comprising:

• obtaining a training data set comprising (i) metrology data of a metrology tool used to measure a printed pattern of a substrate, and (ii) a representation of a mask pattern employed for imaging the printed pattern on the substrate;
• and
• training, based on the training data set, a machine learning model operable to predict a substrate image of the substrate as measured by the metrology tool based on a cost function, wherein the substrate image corresponds to the printed pattern of the substrate as measured via the metrology tool,
• wherein the cost function comprises a relationship between the predicted substrate image and the metrology data.