Thin film resist composition and method for manufacturing resist film using the same

A thick film resist composition comprising polymer (A), a deprotecting agent (B), a photoreaction quencher (C), and a solvent (D),

• wherein the photoreaction quencher (C) is represented by the formula (C-1):
• Cm+cation Cm−anion (C-1)
• wherein,
• Cm+cation consists of at least one cation selected from the group consisting of a cation represented by the formula (CC1) and a cation represented by the formula (CC2), and is m-valent as a whole, where m is 1 to 3:
• wherein,
• Rc1 each independently represents C1-6 alkyl, C1-6 alkoxy or C6-12 aryl, and
• nc1 is each independently 0, 1, 2, or 3,
• wherein,
• Rc2 is each independently C1-6 alkyl, C1-6 alkoxy or C6-12 aryl, and
• nc2 is each independently 0, 1, 2, or 3;
• and
• Cm−anion consists of at least one anion selected from an anion represented by the formula (CA) and is m-valent as a whole:
• wherein,
• X is a C1-20 hydrocarbon group,
• Rc3 is each independently hydroxy, C1-6 alkyl or C6-10 aryl,
• nc3 is 1, 2 or 3, and
• nc4 is 0, 1 or 2.