Template manufacturing method and template base member

A template manufacturing method comprising:

• preparing a structure including a first substrate and a stacked body that is provided on the first substrate, the stacked body including a first lower layer comprising a first material, a first upper layer provided on the first lower layer and comprising a second material different from the first material, a second lower layer provided on the first upper layer and comprising the first material, a second upper layer provided on the second lower layer and comprising the second material, and a cover layer provided over the second upper layer and comprising a third material different from the second material;
• patterning the cover layer to form a first patterned cover layer, a second patterned cover layer and a third patterned cover layer spaced from each other, a first portion of the second upper layer being exposed from a first opening between the first patterned cover layer and the second patterned cover layer, and a second portion of the second upper layer being exposed from a second opening between the second patterned cover layer and the third patterned cover layer;
• forming a resist layer to have a first pattern overlaying the first patterned cover layer, the second patterned cover layer, the third patterned cover layer, the first portion of the second upper layer, and the second portion of the second upper layer;
• removing a third portion of the second upper layer collectively using the cover layer and the first pattern of the resist layer as a mask;
• processing the resist layer to have a second pattern exposing the first patterned cover layer;
• removing the first patterned cover layer;
• processing the resist layer to have a third pattern exposing the first opening;
• and
• removing the first portion of the second upper layer and a portion of the first upper layer collectively using the cover layer and the third pattern of the resist layer as a mask.

A pattern forming method comprising:

• preparing a structure including a first substrate and a stacked body that is provided on the first substrate, the stacked body including a first lower layer comprising a first material, a first upper layer provided on the first lower layer and comprising a second material different from the first material, a second lower layer provided on the first upper layer and comprising the first material, a second upper layer provided on the second lower layer and comprising the second material, and a cover layer provided over the second upper layer and comprising a third material different from the second material;
• patterning the cover layer to form a first patterned cover layer, a second patterned cover layer, and a third patterned cover layer spaced from each other, a first portion of the second upper layer being exposed from a first opening between the first patterned cover layer and the second patterned cover layer, and a second portion of the second upper layer being exposed from a second opening between the second patterned cover layer and the third patterned cover layer;
• forming a resist layer on the first patterned cover layer, the second patterned cover layer, the third patterned cover layer, the first portion of the second upper layer, and the second portion of the second upper layer;
• removing a third portion of the second upper layer using the cover layer and the resist layer as a collective first mask;
• processing the resist layer to expose the first patterned cover layer;
• removing the first patterned cover layer;
• processing the resist layer to expose the first opening;
• and
• removing the first portion of the second upper layer and a portion of the first upper layer using the cover layer and the resist layer as a collective second mask.