Nano pattern manufacturing method, nanoimprint substrate, and display substrate

A method for manufacturing a nano pattern, comprising:

• forming a pattern transfer layer on a base substrate, wherein the pattern transfer layer has N imprint regions, N is an integer greater than or equal to 2;
• and
• performing a plurality of patterning processes on the pattern transfer layer to form an imprint pattern layer, wherein a portion of the imprint pattern layer located in each imprint region is an imprint pattern, N imprint patterns are formed in sequence;
• forming an i-th imprint pattern in an i-th imprint region, i being an integer greater than or equal to 1 and less than or equal to (N−1) includes:
• performing a patterning process in the plurality of patterning processes on a portion of the pattern transfer layer located in the i-th imprint region to form the i-th imprint pattern;
• forming an i-th protective film on a side of the pattern transfer layer away from the base substrate;
• and
• removing at least a portion of the i-th protective film located in an (i+1)-th imprint region to obtain an i-th protective layer and expose a portion of the pattern transfer layer located in the (i+1)-th imprint region, the i-th protective layer being located at least in the i-th imprint region.