Interferent and baseline drift correcting sensor system
AssigneeSumitomo Chemical Company, Limited
InventorsDaniel Tobjork, Nicholas Dartnell, Pascal Cachelin, Robert Archer
Life of this patent
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AssigneeSumitomo Chemical Company, Limited
InventorsDaniel Tobjork, Nicholas Dartnell, Pascal Cachelin, Robert Archer
Estimating the term…
A sensor system that removes responses from an interferent and/or corrects for baseline drift of a sensor to determine a presence, a concentration or a change in concentration of a target material in a gaseous environment. Fluid flowing into the system may be directed by a valve arrangement to either a first fluid flow path or a second fluid flow path. The target material may be absorbed by a filter material in the first fluid flow path. Fluid flowing along the second gas flow path passes directly to the sensor. Responses of the sensor to fluids from the first and second fluid flow paths may be used to determine a presence, concentration or change in concentration of the target material.
A sensor system configured to determine a presence, a concentration or a change in concentration of a target material in a gaseous or liquid environment, comprising:
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A method of determining a presence, concentration or change in concentration of a target material in a gaseous or liquid environment, the method comprising:
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23-34. (canceled)
Dependencies are inferred from the claim text.