Susceptor arrangement of a cvd reactor
AssigneeAixtron SE
InventorsFrancisco RUDA Y WITT, Marcel KOLLBERG, Hendrik RAUF
Life of this patent
Estimating the term…
Abstract
A susceptor arrangement for use in a CVD reactor includes a circular or annular susceptor with a first susceptor broad side, on which a substrate holder and at least one coveting element are arranged. At least one of the covering elements consists of multiple covering plates, in which a lowermost covering plate is adjacent to the first broad side face of the susceptor, and an uppermost covering plate covers the lowermost covering plate at least in certain regions and forms a free broad side face of the susceptor arrangement. The covering plates are preferably produced from silicon carbide, and are connected to one another by positioning elements.
Claims13
(canceled)
A susceptor arrangement, comprising:
- a substrate holder (4);
- at least one covering element (5, 15) comprising a lowermost covering plate (6, 16, 36) and an uppermost covering plate (7, 17);
- a circular or annular susceptor (2) with a first broad side surface (3), on which the substrate holder (4) and the at least one covering element (5, 15) are arranged, wherein the lowermost covering plate (6, 16, 36) adjoins the first broad side surface (3) of the susceptor (2), and the uppermost covering plate (7, 17) at least partially overlaps the lowermost covering plate (6, 16, 36) and forms a free broad side surface (14) of the susceptor arrangement;
- and
- one or more positioning elements (8, 18) inserted into respective openings (13, 19;
- 9, 12) of the lowermost and uppermost covering plates (6, 7, 16, 17, 36), with which the uppermost covering plate (7, 17) is secured to the lowermost covering plate (6, 16, 36) and/or the lowermost covering plate (6, 16, 36) and the uppermost covering plate (7, 17) resting thereupon are secured to the susceptor (2).
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Dependencies are inferred from the claim text.