Polishing composition
AssigneeFujimi Incorporated
InventorsKohsuke TSUCHIYA, Maki ASADA, Taiki ICHITSUBO
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Abstract
Provided is a polishing composition having excellent capability of reducing haze on the surface of an object to be polished. The polishing composition provided by the present invention includes an abrasive, a basic compound, a water-soluble polymer, and water. The water-soluble polymer includes at least a water-soluble polymer P1 and a water-soluble polymer P2. Here, the water-soluble polymer P1 is an acetalized polyvinyl alcohol-based polymer, and the water-soluble polymer P2 is a water-soluble polymer other than the acetalized polyvinyl alcohol-based polymer.
Claims9
A polishing composition comprising an abrasive, a basic compound, a water-soluble polymer, and water, wherein
- the water-soluble polymer includes at least a water-soluble polymer P1 and a water-soluble polymer P2,
- the water-soluble polymer P1 is an acetalized polyvinyl alcohol-based polymer, and
- the water-soluble polymer P2 is a water-soluble polymer other than the acetalized polyvinyl alcohol-based polymer.
Dependencies are inferred from the claim text.