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US 2022/0185720 A1Published application
Process for the preparation of synthetic quartz glass
AssigneeHeraeus Quarzglas GmbH & Co. KG
InventorsMartin THÜRER, Walter LEHMANN, Martin TROMMER
Life of this patent
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Abstract
Described is a process for the production of synthetic fused silica in which the deposition surface is located for a period of at least 50% of the build-up time of the soot body at a burner distance in which the horizontally integrated luminous intensity of the flame of the burner used in the targetless state is still at least ⅔ of the maximum horizontally integrated luminous intensity of the flame.
Claims13
A process for producing synthetic quartz glass, comprising:
- (1) evaporating a feedstock containing at least one organosilicon starting compound to form a feedstock vapor;
- (2) feeding the feedstock vapor from (1) to a reaction zone in which the feedstock vapor is burned in a flame from a burner in the presence of oxygen and is converted to SiO2 soot particles by oxidation or by hydrolysis;
- (3) depositing the SiO2 soot particles resulting from (2) on a deposition surface to form a soot body;
- if necessary, drying and vitrification of the SiO2 particles resulting from (3) to form synthetic fused silica;
- characterized in that in (3), the deposition surface for the SiO2 soot particles is located at a distance from the burner for a period of at least 50% of the build-up time of the soot body, which lies between the position of the maximum of the luminous intensity of the targetless flame up to a position behind the maximum (viewed from the burner) at which the horizontally integrated luminous intensity of the flame is still at least ⅔ of the maximum.
2 more elements
An apparatus for producing synthetic quartz glass comprising:
- (a) at least one evaporator zone for evaporating at least one feedstock containing at least one organosilicon starting compound to form a feedstock vapor, the evaporation zone comprising an evaporation unit;
- (b) at least one reaction zone into which the feedstock vapor is fed from the evaporator zone (a) and in which the feedstock is converted to SiO2 particles by pyrolysis or by hydrolysis, the reaction zone comprising a burner having a flame;
- and
- (c) at least one deposition zone comprising a deposition zone for the SiO2 particles resulting from the reaction zone (b) to form synthetic fused silica, wherein the deposition zone comprises a soot body,
- characterized in that in the reaction zone (b), the distance of the burner from the surface of the soot body can be varied and can be adjusted at least in such a way that the surface of the soot body is located in a range of the flame (=burner distance) which extends between the position (height) of the maximum of the luminous intensity of a targetless reference flame operated under the same gas flows and a point behind the maximum (viewed from the burner) at which the horizontally integrated luminous intensity of the flame (over the entire flame width at the respective height) is still at least ⅔ of the maximum horizontally integrated luminous intensity of the flame.
2 more elements
Dependencies are inferred from the claim text.