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US 2022/0185716 A1Published application
Process for the preparation of synthetic quartz glass
AssigneeHeraeus Quarzglas GmbH & Co. KG
InventorsMartin THÜRER, Walter LEHMANN, Martin TROMMER
Life of this patent
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Abstract
Described is a process for the production of synthetic fused silica in which the feedstock vapor is reacted from an organosilicon starting compound and any combustible burner auxiliary gases at an air number in the burner of less than or equal to 1.00. Furthermore, one embodiment relates to a corresponding apparatus.
Claims15
A process for producing synthetic quartz glass, comprising:
- (1) evaporating a feedstock containing at least one organosilicon starting compound to form a feedstock vapor;
- (2) feeding the feedstock vapor to a reaction zone in which the feedstock vapor is burned in a flame in the presence of oxygen and is converted to SiO2 soot particles by oxidation and/or by hydrolysis;
- (3) depositing the SiO2 soot particles resulting from (2) on a deposition surface to form a soot body;
- and
- (4) if necessary, drying and vitrification of the SiO2 particles resulting from (3) to form synthetic fused silica;
- characterized in that the conversion of the feedstock vapor to be carried out in (2) is carried out at an air number in the burner of less than or equal to 1.00.
3 more elements
Apparatus for producing synthetic quartz glass, comprising:
- (a) at least one evaporator zone for evaporating at least one feedstock containing at least one organosilicon starting compound to form a feedstock vapor, the evaporation zone comprising an evaporation unit;
- (b) at least one reaction zone into which the feedstock vapor resulting from (a) is fed and in which the feedstock is converted to SiO2 particles by pyrolysis or by hydrolysis, the reaction zone comprising a burner having a flame;
- and
- (c) at least one deposition zone comprising a deposition zone for the SiO2 particles resulting from the reaction zone (b) to form synthetic fused silica, wherein the deposition zone comprises a soot body,
- characterized in that the burner has a nozzle which is designed such that
- through the nozzle the feedstock vapor is fed together with oxygen into the reaction zone, and
- the apparatus has means by which the quantity ratio of oxygen to the organosilicon starting compound can be adjusted in such a way that the reaction of the feedstock vapor to be realized is carried out at an air number in the burner of less than or equal to 1.00.
4 more elements
Dependencies are inferred from the claim text.