Power supply and inspection apparatus
AssigneeTokyo Electron Limited
InventorsShigeru KASAI, Fumiya FUJII
Life of this patent
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Abstract
A power supply for supplying a power to a heating mechanism used for heating a measurement target that emits a measurement signal includes an input device configured to output an input signal that reflects a control signal in a differentiable periodic waveform having a frequency of 1 kHz or less. The power supply includes a switching amplifier configured to amplify the input signal from the input device and output the amplified signal.
Claims17
A power supply for supplying a power to a heating mechanism used for heating a measurement target that emits a measurement signal, comprising:
- an input device configured to output an input signal that reflects a control signal in a differentiable periodic waveform having a frequency of 1 kHz or less;
- and
- a switching amplifier configured to amplify the input signal from the input device and output the amplified signal.
An inspection apparatus comprising:
- a stage on which a wafer is placed, wherein a plurality of devices is formed on the wafer;
- an inspection mechanism configured to inspect the devices formed on the wafer placed on the stage by bringing probes into electrical contact with the devices;
- a heating mechanism configured to heat the wafer placed on the stage;
- a power supply configured to supply a power to the heating mechanism;
- and
- a controller configured to send a control signal to the power supply,
- wherein the power supply includes:
- an input device configured to output an input signal that reflects the control signal in a differentiable periodic waveform having a frequency of 1 kHz or less;
- and
- a switching amplifier configured to amplify the input signal from the input device and output the amplified signal.
Dependencies are inferred from the claim text.