Electronic system and method of specimen qualification
AssigneeNanya Technology Corporation
InventorsHung-Chih CHANG, Chug-Chi CHU, Chi-Min TU, Wun-Ye KU
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Abstract
The present disclosure provides an electronic system with defect identification function and a method of qualifying a photoresist pattern formed using a lithography process. The electronic system includes an inspection apparatus and a processor associated with the inspection apparatus. The inspection apparatus is used for acquiring at least one image of the specimen on which a photoresist pattern is formed using a lithography process. The processor is configured to automatically apply machine learning processes implemented through one or more neural networks to identify at least one defect present in the photoresist pattern.
Claims16
An electronic system for specimen qualification, comprising:
- an inspection apparatus used for acquiring at least one image of the specimen on which a photoresist pattern is formed using a lithography process;
- and
- a processor associated with the inspection apparatus and configured to automatically apply machine learning processes implemented through one or more neural networks to identify at least one defect present in the photoresist pattern.
A method of qualifying a plurality of specimens of at least one lot, the method comprising:
- inspecting the plurality of specimens for generating a plurality of images of the specimens;
- performing an automated qualification to determine whether specimens are defective specimens based on the images;
- and
- performing a manual qualification to identify at least one failed specimen from the defective specimens.
Dependencies are inferred from the claim text.