Method of manufacturing metal mask

A method of manufacturing metal mask, comprising:

• providing a growth substrate, wherein the growth substrate has a conductive surface, and the conductive surface has a normal line;
• forming a cover pattern on the conductive surface, wherein the cover pattern is an electric insulator, and the cover pattern has at least one opening and an insulated surface in contact with the conductive surface, the at least one opening extending along the normal line from the insulated surface;
• using the cover pattern as a mask, performing a first electroforming, so as to form a mold part on the conductive surface, wherein the mold part fills the at least one opening and has a conductive pattern surface in contact with the conductive surface, wherein the conductive pattern surface is flush with the insulated surface, and a thickness of the mold part is larger than or equal to a depth of the opening;
• after performing the first electroforming, removing the growth substrate, and reserving the cover pattern and the old part;
• after removing the growth substrate, performing a second electroforming to the conductive pattern surface of the mold part, so as to form a metal pattern on the conductive pattern surface, wherein a material of the mold part is different from a material of the metal pattern;
• and
• after performing the second electroforming, removing the mold part and the cover pattern from the metal pattern.