Deposition apparatus and deposition method
AssigneeTokyo Electron Limited
InventorsYuji OBATA, Tsuneyuki OKABE
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Abstract
A deposition apparatus includes: a decompressable process container; a showerhead configured to supply a gas in the process container, the showerhead including a lower member having a plurality of gas holes and an upper member that forms, between the upper member and the lower member, a diffusion space that diffuses the gas; a mounting table arranged to face the showerhead and to form a process space between the mounting table and the showerhead; a lifting and lowering mechanism configured to lift and lower the mounting table; a cylindrical section that penetrates the showerhead and communicates with the process space; and a pressure sensor that is airtightly provided in the cylindrical section and configured to measure a pressure in the process space.
Claims8
A deposition apparatus comprising:
- a decompressable process container;
- a showerhead configured to supply a gas in the process container, the showerhead including a lower member having a plurality of gas holes and an upper member that forms, between the upper member and the lower member, a diffusion space that diffuses the gas;
- amounting table arranged to face the showerhead and to form a process space between the mounting table and the showerhead;
- a lifting and lowering mechanism configured to lift and lower the mounting table;
- a cylindrical section that penetrates the showerhead and communicates with the process space;
- and
- a pressure sensor that is airtightly provided in the cylindrical section and configured to measure a pressure in the process space.
A deposition method that is performed by a deposition apparatus, the deposition apparatus including
- a decompressable process container;
- a showerhead configured to supply a gas in the process container, the showerhead including a lower member having a plurality of gas holes and an upper member that forms, between the upper member and the lower member, a diffusion space that diffuses the gas;
- amounting table arranged to face the showerhead and to form a process space between the mounting table and the showerhead;
- a lifting and lowering mechanism configured to lift and lower the mounting table;
- a cylindrical section that penetrates the showerhead and communicates with the process space;
- and
- a pressure sensor that is airtightly provided in the cylindrical section and configured to measure a pressure in the process space,
- wherein the deposition method comprises:
- controlling the pressure in the process container based on a measured value of the pressure sensor.
Dependencies are inferred from the claim text.