Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

A substrate processing apparatus comprising:

• a process container in which a substrate is processed;
• a heater configured to heat an interior of the process container;
• a process gas supply system configured to supply a process gas to the interior of the process container;
• a cleaning gas supply system configured to supply a cleaning gas to the interior of the process container;
• and
• a controller configured to be capable of controlling the heater, the process gas supply system, and the cleaning gas supply system so as to perform a process including:
• performing a cycle a predetermined number of times, the cycle including:
• (a) executing a process recipe of processing the substrate by supplying the process gas to the interior of the process container that accommodates the substrate in a state in which the interior of the process container is heated;
• and (b) executing a cleaning recipe of cleaning the interior of the process container by supplying the cleaning gas to the interior of the process container that does not accommodate the substrate in the state in which the interior of the process container is heated, wherein a time from an end of (b) in the cycle until a start of (a) in a next cycle is set to be equal to or less than a time from an end of (a) in the cycle until a start (b) in the cycle.

A non-transitory computer-readable recording medium storing a program that causes, by a computer, a substrate processing apparatus to perform a process comprising:

• performing a cycle a predetermined number of times, the cycle including:
• (a) executing a process recipe of processing a substrate by supplying a process gas to an interior of a process container that accommodates the substrate in a state in which the interior of the process container is heated;
• and
• (b) executing a cleaning recipe of cleaning the interior of the process container by supplying a cleaning gas to the interior of the process container that does not accommodate the substrate in the state in which the interior of the process container is heated,
• wherein a time from an end of (b) in the cycle until a start of (a) in a next cycle is set to be equal to or less than a time from an end of (a) in the cycle until a start of (b) in the cycle.