Cfx layer to protect aluminum surface from over-oxidation
OwnerAnup Kumar SINGH, Vinayak Vishwanath HASSAN +2inventors
InventorsAnup Kumar SINGH, Vinayak Vishwanath HASSAN, Bhaskar KUMAR, Ganesh BALASUBRAMANIAN
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Abstract
In one example, a method includes flowing a carbon-containing gas into a processing volume of a process chamber, the process chamber having internal surfaces comprising aluminum, and depositing a carbon film on the internal surfaces of the process chamber. The method also includes flowing fluorine radicals into the process chamber, and fluorinating the carbon film to create a CFx layer on the internal surfaces. The method also includes oxidizing the CFx layer on the internal surfaces creating an AlOCFx layer on the internal surfaces.
Claims20
A method, comprising:
- flowing a carbon-containing gas into a processing volume of a process chamber, the process chamber having internal surfaces comprising aluminum;
- depositing a carbon film on the internal surfaces of the process chamber;
- flowing fluorine radicals into the process chamber;
- fluorinating the carbon film to create a CFx layer on the internal surfaces;
- and
- oxidizing the CFx layer on the internal surface creating a AlOCFx layer on the internal surface.
A method, comprising:
- flowing a carbon-containing gas into a processing volume of a process chamber, wherein the process chamber includes internal surfaces comprising aluminum;
- depositing a carbon film on the internal surfaces;
- generating fluorine radicals in a remote plasma source and flowing the fluorine radicals into the processing volume for a time of about 5 minutes to about 10 minutes;
- fluorinating the carbon film and creating a CFx layer on the internal surfaces;
- exposing the CFx layer to first oxygen radicals and/or ions;
- and
- oxidizing the CFx layer and creating a AlOCFx layer on the internal surfaces, wherein the thickness of the AlOCFx layer is greater than 100 Å.
A method, comprising:
- flowing acetylene into a processing volume of a process chamber, the process chamber having internal surfaces comprising aluminum;
- depositing a carbon film on the internal surfaces;
- generating fluorine radicals in a remote plasma source from NF3 and flowing the fluorine radicals into the processing volume;
- fluorinating the carbon film and creating a CFx layer on the internal surfaces;
- generating an oxygen plasma within the process chamber using RF power;
- and
- oxidizing the CFx layer on the internal surfaces creating a AlOCFx layer, wherein a thickness of the AlOCFx layer is about 100 Å to about 1000 Å.
Dependencies are inferred from the claim text.