Method for manufacturing mask and deposition apparatus including mask
AssigneeSamsung Display Co., Ltd.
InventorsJI-HEE SON, YOUNGMIN MOON, JAEUOON KIM, SEUNGYONG SONG, SUNGSOON IM, JONG-HYUN CHOUNG, HYUNMIN CHO
Life of this patent
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Abstract
A deposition apparatus includes a chamber, a deposition source disposed in the chamber, a mask assembly, and a base substrate disposed on the mask assembly. The mask assembly includes a frame including frame openings, a mask disposed on the frame and including deposition holes, and a welding stick disposed on the mask. A welding groove is disposed along an edge of the frame and has a depth in the thickness direction of the frame. The welding stick overlaps the welding groove.
Claims20
A deposition apparatus comprising:
- a chamber;
- a deposition source disposed in the chamber;
- a mask assembly comprising:
- a frame including frame openings;
- a mask disposed on the frame, the mask including deposition holes;
- and
- a welding stick disposed on the mask;
- and
- a base substrate disposed on the mask assembly, wherein
- a welding groove is disposed along an edge of the frame, the welding groove having a depth in a thickness direction of the frame, and
- the welding stick overlaps the welding groove.
A method for manufacturing a mask, the method comprising:
- providing a working substrate on which an initial base layer and an initial metal layer are formed, the initial base layer comprising an organic material, and the initial metal layer comprising metal and disposed on the initial base layer;
- forming an initial opening by patterning the initial metal layer through a first photolithography process;
- forming a base layer including a first opening that overlaps the initial opening by etching the initial base layer;
- and
- forming a metal layer including a second opening that overlaps the first opening by patterning the initial metal layer adjacent to the initial opening through a second photolithography process,
- wherein a width of the first opening is greater than a width of the initial opening and less than a width of the second opening.
Dependencies are inferred from the claim text.