Film-forming composition
AssigneeNissan Chemical Corporation
InventorsWataru SHIBAYAMA, Satoshi TAKEDA, Shuhei SHIGAKI, Ken ISHIBASHI, Kodai KATO, Makoto NAKAJIMA
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Abstract
A film-forming composition is suitable as a resist underlayer film-forming composition capable of forming a resist underlayer film that exhibits favorable adhesion to an EUV resist and favorable etching processability. A film-forming composition includes: a hydrolysis condensate (A) of a hydrolyzable silane compound produced in the presence of a basic hydrolysis catalyst; a hydrolysis condensate (B) of a hydrolyzable silane compound produced in the presence of an acidic hydrolysis catalyst; and a solvent.
Claims17
A film-forming composition comprising:
- a hydrolysis condensate (A) of a hydrolyzable silane compound produced in the presence of a basic hydrolysis catalyst;
- a hydrolysis condensate (B) of a hydrolyzable silane compound produced in the presence of an acidic hydrolysis catalyst;
- and
- a solvent.
Dependencies are inferred from the claim text.