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US 2022/0177424 A1Published application
Radiation-sensitive resin composition and method for forming resist pattern
AssigneeJsr Corporation
InventorsRyuichi NEMOTO, Katsuaki Nishikori, Ryosuke Nakamura, Takuhiro Taniguchi
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Abstract
A radiation-sensitive resin composition contains: an onium salt compound represented by formula (1); a resin containing a structural unit having an acid-dissociable group; and a solvent. R1 is a substituted or unsubstituted monovalent organic group having a cyclic structure, or a chain hydrocarbon group having 2 or more carbon atoms. X is an oxygen atom, a sulfur atom, or —NRα—. Rα is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. Z+ is a monovalent onium cation.
Claims12
A radiation-sensitive resin composition comprising:
- an onium salt compound represented by formula (1);
- a resin comprising a structural unit having an acid-dissociable group;
- and
- a solvent:
- wherein R1 is a substituted or unsubstituted monovalent organic group having a cyclic structure, or a chain hydrocarbon group having 2 or more carbon atoms,
- X is an oxygen atom, a sulfur atom, or —NRα—, wherein Rα is a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms, and
- Z+ is a monovalent onium cation.
4 more elements
Dependencies are inferred from the claim text.