Colloidal silica and production method therefor
AssigneeFuso Chemical Co., Ltd.
InventorsHideki Otsuki, Yoshiki Michiwaki, Yuma Negishi, Toshiki Chiba
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AssigneeFuso Chemical Co., Ltd.
InventorsHideki Otsuki, Yoshiki Michiwaki, Yuma Negishi, Toshiki Chiba
Estimating the term…
The present invention provides colloidal silica that exhibits excellent abrasiveness and contains, with high purity, deformed silica particles with excellent compactness and a large amount of alkoxy groups per unit area; the invention also provides a method for producing the colloidal silica in a simple manner with reduced costs. The invention provides colloidal silica containing silica particles having a bent structure and/or a branched structure, wherein the silica particles have a particle density of 1.95 or more, the silica particles have a ratio (m/n) of the content of alkoxy groups m (ppa) to the average primary particle size n (nm) of 200 or more, and the silica particles having a bent structure and/or a branched structure are present in an amount of 15% or more based on the number of particles in a given field of view as observed with a scanning electron microscope at 200,000-times magnification.
A colloidal silica comprising silica particles having a bent structure and/or a branched structure,
A method for producing colloidal silica, the method comprising in series
Dependencies are inferred from the claim text.