Method and system for applying a pattern on a mask layer
AssigneeXeikon Prepress N.V.
InventorDirk Ludo Julien DE RAUW
Life of this patent
Estimating the term…
Abstract
A method for applying a pattern on a mask layer includes obtaining an image file representing pixels with a first pixel size in a first direction parallel to an edge of the pixel, and a second pixel size in a second direction perpendicular to the first direction, where the first and second pixel size are the same or different, treating the mask layer such that a plurality of areas with altered physical properties are created in the mask layer, the plurality of areas corresponding to a plurality of pixels of the image file, where the treatment is done such that a first and/or a second area size of an area of said plurality of areas, seen in said first and/or said second direction, is smaller than the first and/or second pixel size, respectively.
Claims25
A method for applying a pattern on a mask layer, said method comprising:
- obtaining an image file representing pixels with a first pixel size in a first direction parallel to an edge of the pixel, and a second pixel size in a second direction perpendicular to the first direction, wherein the first and second pixel size are the same or different;
- treating the mask layer such that a plurality of areas with altered physical properties are created in the mask layer, said plurality of areas corresponding to a plurality of pixels of the image file, wherein the treatment is done such that a first and/or a second area size of an area of said plurality of areas, seen in said first and/or said second direction, is smaller than the first and/or second pixel size, respectively;
- wherein the method is performed without manipulating the image file for obtaining a surface screen pattern on the mask.
A method for applying a pattern on a mask layer, said method comprising:
- obtaining an image file representing pixels with a first pixel size in a first direction parallel to an edge of the pixel, and a second pixel size in a second direction perpendicular to the first direction, wherein the first and second pixel size are the same or different;
- treating the mask layer such that a plurality of areas with altered physical properties are created in the mask layer, said plurality of areas comprising at least a first and second area corresponding to directly adjacent first and second pixels of the image file, wherein the treatment is done such that the first and second area do not overlap in the first direction and/or in the second direction.
17-18. (canceled)
(canceled)
24-43. (canceled)
A system for applying a pattern on a mask layer, said system comprising:
- a control module configured for obtaining an image file representing pixels with a first pixel size in a first direction parallel to an edge of the pixel, and a second pixel size in a second direction perpendicular to the first direction, wherein the first and second pixel size are the same or different;
- a treatment means configured for treating the mask layer such that a plurality of areas with altered physical properties are created in the mask layer, said plurality of areas corresponding to a plurality of pixels of the image file;
- wherein said control module is further configured to control the treatment such that a first and/or second area size of an area of said plurality of areas, as measured in said first and second direction, is smaller than the first and second pixel size, respectively;
- wherein the controlling is performed without manipulating the image file for obtaining a surface screen pattern on the mask.
A system for applying a pattern on a mask layer, said system comprising:
- a control module configured obtaining an image file representing pixels with a first pixel size in a first direction parallel to an edge of the pixel, and a second pixel size in a second direction perpendicular to the first direction, wherein the first and second pixel size are the same or different;
- a treatment means configured for treating the mask layer such that a plurality of areas with altered physical properties are created in the mask layer, said plurality of areas comprising at least a first and second area corresponding with directly adjacent first and second pixels of the image file;
- wherein said control module is further configured to control the treatment means such that the first and second area do not overlap in the first and/or second direction.
Dependencies are inferred from the claim text.