Composition comprising an ammonia-activated siloxane for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below
AssigneeBASF SE
InventorsChi Yueh Kao, Mei Chin Shen, Sheng Hsuan Wei, Daniel Loeffler, Andreas Klipp, Marcel Brill, Szilard Csihony, Frank Pirrung, Niklas Benjamin Heine
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