High-temperature forming device for imperfect single-crystal wafers used for neutron monochromator

A high-temperature forming device for imperfect single-crystal wafers used for a neutron monochromator, the device comprising:

• a heating electric furnace,
• a temperature control system,
• a die system,
• a loading system,
• a vacuum protection system, and
• an auxiliary system, wherein:
• a furnace mouth of the heating electric furnace faces downwards,
• the heating electric furnace is capable of being lifted vertically or a hearth of the heating electric furnace is capable of being opened and closed,
• the vacuum protection system comprises a glass cover, a vacuum pump, a vacuum gauge, a joint, a blocking flange, and pipelines,
• a body of the glass cover is shaped as a cylinder,
• one end of the body is closed,
• a through hole is formed in an other end of the body, and
• when the glass cover is in a protection state,
• the glass cover is vertically placed,
• the other end with the through hole faces downwards and is located in a water-cooled jacket box of an operation table,
• a liquid level in the water-cooled jacket box is higher than an end face of the other end with the through hole of the glass cover,
• an operation opening is formed in a cylindrical surface of the glass cover and provided with a glove made of an airtight material, and
• the glove and the glass cover are sealed via a flange in a gluing mode;
• and
• the other end with the through hole of the glass cover is supported by a glass cover supporting plate, which is capable of moving up and down in a vertical direction.