Deposition apparatus, method of deposition on a substrate, substrate structure and substrate support
AssigneeApplied Materials Italia S.R.L.
InventorsFrancesca ANTONIOLLI, Marco D'ACUNZO, Marco GALIAZZO, Daniel HADA
Life of this patent
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Abstract
A deposition apparatus includes a first substrate support for supporting a substrate in a substantially vertical orientation. The substrate has a first main surface, a second main surface opposite the first main surface and a side surface between the first main surface and the second main surface. The deposition apparatus includes a first deposition device for depositing a first conductive pattern or a first resist mask on the side surface of the substrate while the substrate is supported in the substantially vertical orientation by the first substrate support.
Claims20
A deposition apparatus, comprising:
- a first substrate support for supporting a substrate in a substantially vertical orientation, the substrate having a first main surface, a second main surface opposite the first main surface and a side surface between the first main surface and the second main surface;
- and
- a first deposition device for depositing a first conductive pattern or a first resist mask on the side surface of the substrate while the substrate is supported in the substantially vertical orientation by the first substrate support.
A deposition apparatus, comprising:
- a first printing device;
- a first orientation-changing device downstream of the first printing device;
- a second printing device downstream of the first orientation-changing device;
- a second orientation-changing device downstream of the second printing device;
- and
- a third printing device downstream of the second orientation-changing device.
A method of deposition on a substrate, comprising:
- providing a substrate in a substantially vertical orientation, the substrate having a first main surface, a second main surface opposite the first main surface and a side surface between the first main surface and the second main surface;
- depositing a first conductive pattern or a first resist mask on the side surface of the substrate while the substrate is in the substantially vertical orientation.
A substrate structure, comprising:
- a substrate having a first surface, a second surface opposite the first surface and a side surface between the first surface and the second surface;
- and
- a plurality of electrical connections connecting the first surface with the second surface, each electrical connection comprising:
- a conductive line on the first surface;
- a conductive line on the side surface;
- and
- a conductive line on the second surface,
- the conductive line on the side surface contacting the conductive line on the first surface and the conductive line on the second surface.
A substrate structure, comprising:
- a substrate having a first surface, a second surface opposite the first surface and a side surface between the first surface and the second surface;
- and
- a resist mask including:
- a first resist mask portion covering a portion of the side surface, the first resist mask portion having a first plurality of line-like openings;
- a second resist mask portion covering a portion of the first surface, the second resist mask portion having a second plurality of line-like openings;
- and
- a third resist mask portion covering a portion of the second surface, the third resist mask portion having a third plurality of line-like openings,
- wherein each line-like opening of the first plurality of line-like openings is adjacent to a line-like opening of the second plurality of line-like openings and to a line-like opening of the third plurality of line-like openings.
A substrate support for supporting a substrate in a substantially vertical orientation, the substrate support comprising:
- a first surface, the first surface being a stationary surface which is substantially vertical or a movable surface which is movable between a first position and a second position, wherein in the second position the first surface is substantially vertical;
- and
- a substrate attraction device adjacent to the first surface.
A substrate support for a deposition apparatus, the substrate support comprising:
- a housing comprising a slit to receive a substrate in a substantially vertical orientation.
A substrate support, comprising:
- a first surface, the first surface being a stationary surface which is substantially vertical or a movable surface which is movable between a first position and a second position, wherein in the second position the first surface is substantially vertical;
- and
- a biasing device for biasing a substrate against the first surface, the substrate having a first main surface, a second main surface opposite the first main surface and a side surface between the first main surface and the second main surface,
- the substrate support being configured for holding the substrate in a substantially vertical orientation in a manner such that the side surface of the substrate is exposed for deposition of a material on the side surface.
Dependencies are inferred from the claim text.