Device for modifying a linear substrate
AssigneeSouthwire Company
InventorJuan Alberto Galindo Gonzalez
Life of this patent
Estimating the term…
Abstract
An apparatus and method for modifying an aspect of an exterior polymer material or polymer type material of a linear substrate with a fluid. The apparatus include a variable exposure gap within which the linear substrate is exposed to the fluid. The width of the exposure gap is varied with the speed of the linear substrate traversing the exposure gap to maintain a constant exposure time of the linear substrate with the modifying fluid.
Claims20
A method for modifying an aspect of a linear substrate, the method comprising:
- providing a processing barrel comprising a chamber defined therein, the processing barrel further comprising a linear substrate inlet into the chamber and a linear substrate outlet out of the chamber;
- defining an exposure gap between the linear substrate inlet and the linear substrate outlet, the linear substrate inlet and the linear substrate outlet being moveable between a plurality of relative positions each defining a different length of the exposure gap, wherein the length of the exposure gap is reconfigurable from zero to greater than zero, and wherein a maximum length of the exposure gap is less than a longitudinal length of the processing barrel;
- adjusting a length of the exposure gap;
- and
- traversing a linear substrate across the exposure gap at a given speed.
The method of claim 7, wherein maintaining the constant exposure time comprises increasing the length of the exposure gap upon an increase in the given speed.
A method for modifying an aspect of a linear substrate, the method comprising:
- providing a device comprising an outer processing vessel having a longitudinal length and an inner processing vessel, the inner processing vessel and the outer processing vessel forming a nested arrangement along the longitudinal length of the outer processing device, the device further comprising a linear substrate inlet and a linear substrate outlet;
- defining an exposure gap between the linear substrate inlet and the linear substrate outlet, the linear substrate inlet and the linear substrate outlet being moveable between a plurality of relative positions each defining a different length of the exposure gap, wherein the length of the exposure gap is reconfigurable from zero to greater than zero, and wherein a maximum length of the exposure gap is less than the longitudinal length of the outer processing vessel;
- providing a modifying fluid in the exposure gap;
- adjusting the length of the exposure gap;
- and
- traversing a linear substrate across the exposure gap at a given speed.
A device for modifying an aspect of a linear substrate, the device comprising:
- outer processing vessel having a longitudinal length;
- an inner processing vessel forming a nested arrangement along the longitudinal length of the outer processing device with at least a portion of a chamber defined therebetween;
- and
- a linear substrate inlet into the chamber and a linear substrate outlet out of the chamber;
- and
- an exposure gap defined between the linear substrate inlet and the linear substrate outlet, the linear substrate inlet and the linear substrate outlet being moveable between a plurality of relative positions each defining a different length of the exposure gap, wherein a length of the exposure gap is reconfigurable from zero to greater than zero, and wherein a maximum length of the exposure gap is less than the longitudinal length of the processing barrel, wherein the length of the exposure gap is adjusted based on a speed of a linear substrate traversing across the exposure gap.
Dependencies are inferred from the claim text.