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US 2022/0119750 A1Published application
Patterned, dendrimeric substrate surfaces and production and use thereof
AssigneeKarlsruher Institut für Technologie
InventorsMaximilian BENZ, Pavel A. LEVKIN
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Abstract
The present invention relates to a patterned substrate comprising first regions having first dendrimer structures and second regions having second dendrimer structures on a surface of the substrate, as well as a to method for manufacturing a patterned substrate and the use of a patterned substrate for the chemical synthesis of a chemical synthesis product, as a characterizing platform and/or as a platform for cell treatment and/or cell cultivation.
Claims14
A patterned substrate comprising first regions and second regions on a surface of the substrate, wherein
- the first regions have first dendrimer structures and the second regions have second dendrimer structures;
- the dendrimer structures are each covalently connected with the substrate surface;
- the second regions enclose the first regions;
- and
- the second dendrimer structures have at least one structural element different from the structural elements of the first dendrimer structures.
2 more elements
Dependencies are inferred from the claim text.